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- Newsgroups: sci.engr.chem
- Path: sparky!uunet!walter!porthos!prefect!tony2
- From: tony2@prefect.uucp (21131-gozdz)
- Subject: Re: Optical resist processing
- Organization: Bellcore, Livingston, NJ
- Date: Wed, 2 Sep 92 12:02:44 GMT
- Message-ID: <1992Sep2.120244.8056@porthos.cc.bellcore.com>
- Keywords: photoresists; SAMPLE
- Sender: netnews@porthos.cc.bellcore.com (USENET System Software)
- Lines: 28
-
- In article <1992Sep2.070104.14358@nntp.hut.fi> s32781h@saha.hut.fi (PP Ahonen) writes:
- >I am doing a project on optical positive resist processing.
- >Among the articles read through I found a general process
- >simulator called SAMPLE (Simulation and Modeling of Profiles
- >in Lithography and Etching) by University of California at
- >Berkeley mentioned. Could someone please tell me more about
- >the program: availability, price, student version availability,
- >contacts and also general info as well as opinions are appreciated.
- >Thanks very much in advance.
- >---
- >s32781h@saha.hut.fi in real life is Mr Petri Ahonen from Finland.
-
- Well, there are actually two well-known photoresist
- modeling software packages. One is SAMPLE, a creation
- of Prof. Andy Neureuther et al. (Dept. EE & CE, UC Berkeley),
- and the second, gaining in popularity because of numerous
- options included, such as contrast enhancement etc, by
- Chris Mack & Co. (Finle Technologies, Plano, TX 75026)
- The second one looks very glitzy. Forgot the prices, thou :-(.
-
- Hope it helps.
-
- Tony
-
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- Antoni S. Gozdz tel (908) 758-2931 | Bellcore NVC 3X-261
- tony2@prefect.cc.bellcore.com FAX (908) 741-2891 | Red Bank, NJ 07701, USA
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